The paper on dielectric layered nickel oxyfluoride thin films has been published in J. Mater. Chem. C. This is the result of joint research with the University of Tokyo and Hokkaido University. “Improvement of electric insulation in dielectric layered perovskite nickelate films via fluorination”

The paper on solid-phase epitaxial growth of Ta3N5 thin films has been published in J. Phys. Chem. Lett.. This is the result of joint research with the University of Tokyo. “Heteroepitaxial Growth of a Ta3N5 Thin Film with Clear Anisotropic Optical Properties“

Chikamatsu gave an invited talk titled “Modulating physical properties of strongly correlated oxide thin films by anion doping” at The Materials Research Meeting 2021 held at Pacifico Yokohama.

Chikamatsu gave a presentation entitled “Research on Physical Chemistry in Solids: Synthesis and Physical Properties of Mixed Anion Oxides” at the 2021 workshop of the Department of Chemistry.

Web site of Chikamatsu Laboratory has been opened.

Akira Chikamatsu has joined the Department of Chemistry, Faculty of Science, Ochanomizu University. Chikamatsu Laboratory has been started.