Pulsed laser deposition system (2 units in operation)

It is used to fabricate single-crystalline thin films. An Nd:YAG laser is used as the laser source.

 

Sputtering deposition system

It is used to fabricate metal thin films.

 

Quick coater

It is used for metal electrode deposition.

 

Tube furnace (3 units in operation)

It is mainly used for topochemical reactions.

 

Electric furnace (4 units in operation)

It is used for synthesis of oxide polycrystals and annealing of substrates.

 

X-ray diffractometer for thin films

It is equipped with a two-dimensional detector. It evaluates the crystal structure and crystallinity of thin films.

 

Stylus profilometer

It is used to measure the thickness of thin films.

 

UV-Vis spectrometer

It is used to measure the optical band gap.

 

Source meter

It evaluates the conductivity of thin films by 4-terminal resistance measurement method.

 

Computer server

It is used to perform first-principles electronic structure calculations.

 

X-ray photoemission spectrometer (Shared equipment)

It is used to investigate chemical composition and electronic states.